MAFAC Technology and Process Expertise for Semiconductor and Precision Optics Cleaning

Whether micromechanics, engine components, tool inserts or fluid components:

MAFAC has patented cleaning technologies that are precisely tailored to high-purity requirements. They form the basis for robust, validatable processes in highly sensitive semiconductor and optical applications. The combination of processes, technical equipment and process control are precisely tailored to components, surfaces, purity requirements and the production environment.

 

Plant engineering for high-purity applications
Materials, surface finishes and processing technologies precisely tailored to high-purity specifications, optionally supplemented by protective systems such as laminar flow boxes.

Water-based high-purity cleaning
Solvent-free and gentle on materials – without damaging sensitive surfaces. Designed for materials with the highest requirements in terms of outgassing behaviour and HIO-relevant residual contamination.

Application-oriented process design
Consideration of vacuum and lithography-related conditions when selecting media, processes and system components.

Multi-stage cleaning and rinsing concepts
Two- or three-bath systems with controlled media flow to reliably prevent back and cross-contamination.

High-performance drying processes
Hot air, impulse blowing or vacuum – individually or in combination for defined drying results down to absolutely dry, even in internal contours and on structurally critical functional surfaces.

Precisely controllable process parameters
Pressure, temperature, time and media quality can be adjusted with precision – for reproducible component cleanliness across variants and series. 

Automated, workpiece-guided processes
Closed, operator-independent process control in the system for consistent cleaning and drying results.

Automated, workpiece-guided sequences and process solutions
Closed, operator-independent process control in the system, scalable transfer system with integrated laminar flow modules for controlled component handling and minimised AMC back loading.

Audit-proof process monitoring
Continuous inline recording of quality-critical process parameters – for trend analyses, early drift detection and data-based process approvals with full traceability.